20 June 2012
Gesellschaft für Elektrometallurgie mbH (GfE) is a worldwide provider of sputter targets for thin-film photovoltaic (PV) cell manufacturing. It provides targets of all shapes and sizes.
GfE is a large supplier of alumina doped zinc oxide (AZOY), as well as intrinsic zinc oxide (i-ZnO) planar and rotatable targets for PV transparent conductive oxide (TCO) thin films. Continuous improvement of standard products, as well as the research and development (R&D) of new products, are the key competencies of GfE. These capabilities allow the company to support the industry in coping with increasing requirements while working to reduce production costs. GfE covers a wide range of coating materials used in copper indium gallium selenide (CIGS), amorphous silicon (a-Si), cadmium telluride (CdTe) and wafer-based cells.
GfE has developed unique Freiloc bonding methods for rotatable targets. The Freiloc 4 series allows increased sputtering power to be used with rotatables compared to classic indium bonding. GfE ensures 18 kilowatts per metre (kW/m) as a power level for sputter deposition using this bonding method. Materials offered for thin-film PV sputtering targets include: various levels of AZOY, i-ZnO, zinc oxide/gallium oxide (ZnO/Ga2O3), ZnO/magnesium oxide (MgO), titania (TiOx), chromium (Cr), molybdenum (Mo), silver (Ag), aluminium (Al), high-purity silicon (Si) and nichrome (NiCr).
GfE will exhibit at Intersolar North America 2012 on 10-12 July at the Moscone Centre (North hall, booth 5638) in San Francisco, California (US).
